TopWave DUV

Industrial CW UV laser

A coherent choice for DUV applications

TopWave DUV

Industrial CW UV laser

Your Benefits

Excellent lifetime

More than 10,000 h thanks to sealed UV beam path and automated optics shifter.

Clearer measurements

Below 0.1 % RMS noise for a signal-to-noise ratio that meets highest demands.

Designed for OEM integration

Turnkey operation, low cost of ownership, longevity thanks to highest-quality components, and passive cooling make the TopWave 266 ideal for system integration.

Applications

Semicon inspection & metrology

Laser-based metrology and inspection have become indispensable tools for shrinking feature sizes, more and thinner layers, as well as increasing chip and package areas.

Laser based mask writing

Cost-efficient lithography process in which a focused laser beam directly writes precise features without using a physical reticle, enabling high accuracy and flexibility in semiconductor mask fabrication. Wavelengths around 400 nm are used to take advantage of well-established i-line photoresists. Using lasers at 405nm minimum linewidths of 500nm and CD uniformities < 15 nm can be achieved.

Raman spectroscopy

Well-suited for Raman spectroscopy of inorganic materials, for which no fluorescence obscures the Raman signal. Raman intensity depends on the excitation wavelength by a factor 1/λ4 . Our lasers for this application allow for a strong Raman signal that remains detectable by Si-based detectors.

Interference lithography

High coherence, minimum frequency drift and excellent beam quality are key for generating micro and nanostructures via interference lithography. Watt-level laser power enable processing large area substrates with highest quality outcome and significantly reduces exposure times.

Lithography & microfabrication

From semiconductor patterning and 3D microprinting to holographic optics and transparent displays, laser light is the most precise tool.

Options

TopWave chiller

Optional Closed-Loop Chiller for TopWave. While the TopWave can be operated without chiller in the specified operating conditions, the TopWave chiller option can be advantageous in less controlled environments or help to just improve warm-up times and overall system stability.

Specifications

Talk to an expert Request a quotation Request a demo

Downloads

PDF

Technical Drawings

Technical drawings TopWave 266

Literature

Articles

Direct and frequency-converted diode lasers provide all wavelengths for holography

Ulrich Eismann in Laser Focus World (2018), Japanese
Raman Deep Ultraviolet - Visible Spectrograph Concepts for Lunar and Ocean World Missions

Presentation in Bulletin of the AAS

Whitepaper

Demonstration of a compact deep UV Raman spatial heterodyne spectrometer

is-instruments

TopWave DUV

TopWave DUV

Your Benefits

Applications

Options

Specifications

Related Products

Downloads

PDF

Product data sheet TopWave 229

Product data sheet TopWave 257

Product data sheet TopWave 266

Technical Drawings

Technical drawings TopWave 266

Literature

Articles

Direct and frequency-converted diode lasers provide all wavelengths for holography

Raman Deep Ultraviolet - Visible Spectrograph Concepts for Lunar and Ocean World Missions

Whitepaper

Demonstration of a compact deep UV Raman spatial heterodyne spectrometer